Variation of switching mechanism in TiO2 thin film resistive random access memory with Ag and graphene electrodes
نویسندگان
چکیده
0167-9317/$ see front matter 2012 Elsevier B.V. A http://dx.doi.org/10.1016/j.mee.2012.11.009 ⇑ Corresponding authors. Tel.: +1 412 648 8989. E-mail addresses: [email protected] (M. Yun), We report the fabrication of resistive random access memory (ReRAM) on both Si and PET flexible substrates using TiO2 as the dielectric spacer between Ag electrodes. Ag/TiO2/Ag ReRAM shows unipolar switching behavior with a ramping rate of 50 mV. We further examined the switching mechanism for Ag based ReRAM in the low resistive state (LRS) and high resistive states (HRS). To elucidate the impact of electrode material on the switching mechanism, we fabricated a graphene/TiO2/graphene ReRAM device and observed that the switching behavior changed from unipolar to bipolar due to the unique physical properties of graphene. This study demonstrates ReRAM based on Ag and graphene electrodes on both Si and PET substrates, and directly demonstrates the strong dependence of electrode materials on the switching mechanism. 2012 Elsevier B.V. All rights reserved.
منابع مشابه
Investigation of resistive switching in anodized titanium dioxide thin films
In this work, TiO2 nanostructures were grown on titanium thin films by electrochemical anodizing method. The bipolar resistive switching effect has been observed in Pt/TiO2/Ti device. Resistive switching characteristics indicated the TiO2 nanotubes are one of the potential materials for nonvolatile memory applications. Increasing anodizing duration will increase nanotube lengths which itself c...
متن کاملImproved switching characteristics of TiO2-x ReRAM with embedded ultra-thin
Transition metal-oxide resistive random access memory (RRAM) devices have demonstrated excellent performance in switching speed, versatility of switching and low-power operation. However, this technology still faces challenges like poor cycling endurance, degradation due to high electroforming switching voltages and low yields. Engineering of the active layer by doping or addition of thin oxide...
متن کاملOn the Origin of Resistive Switching Volatility in TiO2 thin films
Resistive switching (RS) and Resistive Random Access Memories (ReRAMs) that exploit it have attracted huge interests for next generation non volatile memory (NVM) applications, also thought to be able to overcome flash memories limitations when arranged in crossbar arrays. A cornerstone of their potential success is that the RS between two different resistive states, usually High (HRS, High res...
متن کاملInvestigation of the Switching Mechanism in TiO2-Based RRAM: A Two-Dimensional EDX Approach.
The next generation of nonvolatile memory storage may well be based on resistive switching in metal oxides. TiO2 as transition metal oxide has been widely used as active layer for the fabrication of a variety of multistate memory nanostructure devices. However, progress in their technological development has been inhibited by the lack of a thorough understanding of the underlying switching mech...
متن کاملImproved Uniformity of Resistive Switching Characteristics in Ag/HfO2/Pt ReRAM Device by Microwave Irradiation Treatment
The bipolar resistive switching characteristics of resistive random access memory (ReRAM) based on HfO2 thin films have been demonstrated by using Ag/HfO2/Pt structured ReRAM device. MIcrowave irradiation (MWI) treatment at low temperature was employed in device fabrication with HfO2 thin films as a transition layer. Compared to the as-deposited Ag/HfO2/Pt device, highly improved uniformity cha...
متن کامل